Carbon sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.999% (metals basis)
Ref. 02-040832
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Informação sobre produto
Used as Magnetron sputtering source. The carbon sputtering target was replaced after the de- positions of 20-30 films with several thousand A in thick- ness in mass-separated negative-ion-beam deposition system. Carbon films can also be deposited by magnetron sputtering in which a magnetically confined plasma torus (race track) acts as a distributed source of ions that impact a carbon sputtering target over a significant part of its area. C -ions were produced from a highly pure carbon-sputtering target by cesium ion sputtering in a neutral and ionized alkaline bombardment-type heavy negative ion source. CN negative ions of 0.88 mA were safely obtained by using a carbon sputtering target and nitrogen gas instead of cyanogen for ionization. This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.
Propriedades químicas
Consulta técnica sobre: 02-040832 Carbon sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.999% (metals basis)
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